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BSEM-500X Ultra-high Resolution Field Emission Scanning Electron Microscope
BSEM-500X Ultra-high Resolution Field Emission Scanning Electron Microscope
BSEM-500X Ultra-high Resolution Field Emission Scanning Electron Microscope
BSEM-500X Ultra-high Resolution Field Emission Scanning Electron Microscope
BSEM-500X Ultra-high Resolution Field Emission Scanning Electron Microscope
BSEM-500X Ultra-high Resolution Field Emission Scanning Electron Microscope
BSEM-500X Ultra-high Resolution Field Emission Scanning Electron Microscope
BSEM-500X Ultra-high Resolution Field Emission Scanning Electron Microscope
BSEM-500X Ultra-high Resolution Field Emission Scanning Electron Microscope
BSEM-500X Ultra-high Resolution Field Emission Scanning Electron Microscope
BSEM-500X Ultra-high Resolution Field Emission Scanning Electron Microscope
BSEM-500X Ultra-high Resolution Field Emission Scanning Electron Microscope
BSEM-500X Ultra-high Resolution Field Emission Scanning Electron Microscope
BSEM-500X Ultra-high Resolution Field Emission Scanning Electron Microscope

BSEM-500X Ultra-high Resolution Field Emission Scanning Electron Microscope

Introduction

BSEM-500X is an ultra-high resolution Field Emission Scanning Electron Microscope with breakthrough resolution of 0.6 nm@15 kV and 1.0 nm@1 kV. Benefited from the upgraded column engineering process, “Super Tunnel” technology, and high-resolution objective lens design, BSEM-500X is able to achieve further improvements in low-voltage imaging resolution.

Details

Model:BSEM-500X
Electron Optical System:Schottky Field Emission Electron Gun
Resolution:0.6nm@15kV (SE), 1.0nm@1.0kV (SE)
Magnification:1-2,500,000x
Accelerating Voltage:20V-30kV
Vacuum System:Fully Automated Control
Camera:Dual Cameras
Stage Range:X: 110mm. Y: 110mm. Z: 65mm. R: 360° T: -10°- +70°
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Overview

Packaging & Delivery

Packaging Details:Strong Carton with Polyfoam Protection

Port:Beijing

Lead Time:Within 2-4 Weeks after Receiving Payment

Introduction

BSEM-500X is an ultra-high resolution Field Emission Scanning Electron Microscope with breakthrough resolution of 0.6 nm@15 kV and 1.0 nm@1 kV. Benefited from the upgraded column engineering process, “Super Tunnel” technology, and high-resolution objective lens design, BSEM-500X is able to achieve further improvements in low-voltage imaging resolution. The specimen chamber ports extend to a number of 16, and the specimen exchange load-lock supports up to 8-inch wafer size (maximum diameter 208 mm), which greatly expand the coverage of applications. The advanced scanning modes and enhanced automated functions bring stronger performance and an even more optimized experience.

Features

1. Ultra-high resolution

Ultra-high resolution imaging with breakthrough 0.6nm@15kV and 1.0nm@1kV.

2. Super Tunnel Technology

Dual deceleration technology combining specimen stage tandem deceleration and “Super Tunnel” technology, ready to challenge extreme imaging conditions.

3. Mechanical Eucentric Specimen Stage

High-precision mechanical eucentric specimen stage, ultra-stable vibration-damping design, also available with integral enclosure option, greatly minimized the environmental interference that could impact the resolution.

4. Specimen Exchange Loadlock

Specimen exchange loadlock with up to 8″ wafer size (Maximum 208 mm in diameter), meets the needs of semiconductor and research applications.

5. Focused Ion Beam Column

The focused ion beam column which outputs a highly stable, high-quality ion beam, suit able for high-quality nano-fabrication and TEM specimen preparation.

Application

Mesoporous Silica        1kV (Dul-Dec)/Inlens

Anodized Aluminum Plate        10kV/Inlens

IC Clip                    5kV/BSED-COMP

Kidney Sections            5kV/BSED-COMP

Nickel Foam                    2kV/ETD-SE

Sapphire Substrate              5kV/ETD-SE

Gold Particles                   1kV/Inlens

Photoresist                    2kV/ETD-SE

Magnetic Powder               10kV/Inlens

Silicon Dioxide Spheres          3kV/ETD-SE

Catalyst                       1kV/ETD-SE

Waveguide                    1kV/ETD-SE

Specification

Item

Specification

BSEM-500X

Electron Optical System

Schottky Field Emission Electron Gun

Resolution: 0.6nm@15kV (SE), 1.0nm@1.0kV (SE)

Magnification: 1-2,500,000x

Accelerating voltage: 20V-30kV

Detector and Extension

In lens Detector

Everhart-Thornley Detector (ETD)

Retractable Back-Scattered Electron Detector (BSED)

Retractable Scanning Transmission Electron Microscopy Detector (STEM)

Energy Dispersive Spectrometer (EDS)

Electron Backscatter Diffraction Pattern (EBSD)

Specimen Exchange Loadlock (4″ & 8″ optional)

Trackball & Knob Control Panel

Specimen Stage Tandem Deceleration

Magnetic Field & Acoustic Noise Enclosure System (SEMI Certified)

Specimen Chamber

Vacuum system: Fully Automated Control

Camera

Dual Cameras

Optical navigation

Chamber monitor

5-Axis Mechanical EU centric Specimen Stage

Stage Range: X: 110mm. Y: 110mm. Z: 65mm. R: 360° T: -10°- +70°

Software

Windows. Nav-Cam, Gesture Quick Navigation. Auto Brightness Contrast, Auto Focus, Auto Stigmator.

Note: ● Standard Outfit, ○ Optional

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