BSEM-500 Field Emission Scanning Electron Microscope
Introduction
BSEM-500 is a field emission scanning electron microscope with high-resolution imaging and analysis ability, supported by abundant functions, benefits from advanced electron optics column design, with high-pressure electron beam tunnel technology (Super Tunnel), low aberration, and MFL objective lens, achieves low voltage high-resolution imaging, the magnetic specimen can also be analyzed.
Details
Overview
Packaging & Delivery
Packaging Details:Strong Carton with Polyfoam Protection
Port:Beijing
Lead Time:Within 2-4 Weeks after Receiving Payment
Introduction
BSEM-500 is a field emission scanning electron microscope with high-resolution imaging and analysis ability, supported by abundant functions, benefits from advanced electron optics column design, with high-pressure electron beam tunnel technology (Super Tunnel), low aberration, and MFL objective lens, achieves low voltage high-resolution imaging, the magnetic specimen can also be analyzed.
With optical navigation, automated functionalities, carefully designed human-computer interaction user interface, and optimized operation and use process, no matter if you are an expert or not, you can quickly get started and complete high-resolution imaging and analysis work.
Features
1. High resolution
High-resolution imaging at low accelerating voltage.
2. Super Tunnel
High-pressure tunneling technology (Super Tunnel) ensures low voltage resolution.
3. Electromagnetic composite objective
Electromagnetic composite objective improves low-voltage resolution and enables magnetic samples
observation.
4. The electronic optical path without crossover
The electronic optical path without crossover reduces system aberration and improves resolution.
5. Water-cooled constant temperature objective lens
Water-cooled constant temperature objective lens ensure the stability, reliability, and repeatability.
6. Automatic switchable apertures
Magnetic deflected six-hole various aperture system, with automatic switchable apertures, no mechanical adjustment needed, achieves high-resolution imaging or large beam analysis mode through a click-away fast switching.
Application
Glass Substrate 3kV/15000X/ETD
Catalyst 5kV/10000X/Inlens
Escherichia Coli 3kV/10000X/Inlens
Boron Nitride Nanosheet 3kV/10000X/ETD
Ternary Positive Precursor 3kV/20000X/Inlens
High Entropy Alloy Powder 10kV/1000X/BSED
Copper Metal Powder 3kV/Inlens
Ceramic Cross Section 3kV/Inlens
Lithium Cobaltate 3kV/Inlens
Nanoflower 1kV/Inlens
Plant Sections 30kV/STEM-BF
Plant Sections 30kV/STEM-DF
Plant Sections 30kV/STEM-HAADF
Boehmite 5kV/BSED
Steel Inclusions 15kV/BSED
Steel Inclusions 15kV/Inlens
Mesoporous Silica 1kV/Inlens
Photovoltaic Silicon Wafer 5kV/ETD
Specification
Item |
Specification |
BSEM-500 |
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Electron Optical System |
High Brightness Schottky Field Emission Electron Gun |
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Resolution: 0.9nm@15kV (SE), 1.3nm@1.0kV (SE), 0.8nm@30kV (STEM) |
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Magnification: 1-2,500,000x |
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Accelerating voltage: 20V-30kV |
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Detector and Extension |
In lens SE Detector |
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Everhart-Thornley Detector (ETD) |
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BSE |
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EBSD |
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Vibration Isolation table |
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Trackball & Knob control panel |
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Specimen Chamber |
Vacuum system: Fully Automatic Control, Oil-free Vacuum System |
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Camera |
Dual Cameras |
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Optical Navigation |
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In-Chamber Monitor |
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Stage Range |
X: 125mm. Y: 125mm. Z: 50mm. R: 360° T: -10°- +90° |
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Extra-large chamber version |
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Software |
Windows. Optical Navigation, Gesture Navigation. Auto Brightness & Contrast, Auto Focus, Auto Astigmatism. |
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Note: ● Standard Outfit, ○ Optional