BDB-500 Focused Ion Beam Scanning Electron Microscope
Introduction
BDB-500 is a Field Emission Scanning Electron Microscope with Focused Ion Beam column for nano-analysis and specimen preparation, which is applied with ‘Super Tunnel’ technology, low aberration and magnetic-free objective lens design, with Low-voltage & High-resolution ability that ensures its nano-scale analytical capability.
Details
Overview
Packaging & Delivery
Packaging Details:Strong Carton with Polyfoam Protection
Port:Beijing
Lead Time:Within 2-4 Weeks after Receiving Payment
Introduction
BDB-500 is a Field Emission Scanning Electron Microscope with Focused Ion Beam column for nano-analysis and specimen preparation, which is applied with ‘Super Tunnel’ technology, low aberration and magnetic-free objective lens design, with Low-voltage & High-resolution ability that ensures its nano-scale analytical capability.
The ion column facilitates a Ga+ liquid metal ion source with highly stable and high-quality ion beam to ensure nano-fabrication capability. BDB-500 is equipped with an integrated nano-manipulator, gas injection system, electrical anti-contamination mechanism for objective lens, and with 24 expansion ports, making it an all-around nano-analysis and fabrication platform with comprehensive configurations and expandability.
Features
1. Super Tunnel
‘Super Tunnel’ Electron Optics technology with a magnetic-free objective lens, suitable for high-resolution imaging, and compatible with magnetic specimen imaging.
2. Gallium Ion Beam
The focused ion beam column which outputs a highly stable, high-quality ion beam, suitable for high-quality nano-fabrication and TEM specimen preparation.
3. Integrated Manipulator
A piezoelectrically-driven manipulator located in the specimen chamber with an integrated control system for precise handling.
4. Expandability
Independently developed system with strong expandability. The integrated ion source assembly design for quick ion source exchange.
Application
Gold Wire 30kV/800X/ETD
IC Clip 1 1kV/1500X/ETD
IC Clip 2 1kV/15000X/ETD
Specification
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Item |
Specification |
BDB-500 |
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Electron Beam System |
High Brightness Schottky Field Emission Electron Gun |
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Resolution: 1.2nm@15kV |
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Accelerating voltage: 20V-30kV |
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Ion Beam System |
Liquid Gallium Ion Source |
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Resolution: 3nm@30kV |
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Accelerating voltage: 500V-30kV |
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Detector and Extension |
In-lens Detector |
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Everhart-Thornley Detector (ETD) |
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Retractable Back-Scattered Electron Detector (BSED) |
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Retractable Scanning Transmission Electron Microscopy Detector (STEM) |
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Energy Dispersive Spectrometer (EDS) |
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Electron Backscatter Diffraction Pattern (EBSD) |
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Nano-manipulator |
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Gas Injection System |
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Plasma Cleaner |
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Specimen Exchange Loadlock |
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Trackball & Knob Control Panel |
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Specimen Chamber |
Vacuum system: Fully Automated Control, Oil-free Vacuum System |
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Camera |
Three Cameras |
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Optical navigation |
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chamber monitor |
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Stage type: 5-axis Mechanical EU centric Specimen Stage |
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Stage Range: X: 110mm. Y: 110mm. Z: 65mm. R: 360° T: -10°- +70° |
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Software |
Windows. Nav-Cam, Gesture Quick Navigation. Auto Brightness & Contrast, Auto Focus, and Auto Stigmator. |
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Note: ● Standard Outfit, ○ Optional
Accessories
1. Focused Ion Beam Column
Resolution: 3 nm@30 KV
Probe current: 1 pA-50 nA
Accelerating voltage range: 500 V-30 kV
Ion source exchange interval: ≥1000 hours
Stability: 72 hours of uninterrupted operation
2. Nano-manipulator
Chamber internally mounted
Three-axis all-piezoelectrically driven
Stepper motor accuracy ≤10 nm
Maximum travel speed 2 mm/s
Integrated control
3. Ion Beam-Electron Beam Collaboration
4. Gas Injection System
Single GIS design
Various gas precursor sources are available
Needle insertion distance ≥35 mm
Motion repeatability ≤10 μm
Heating temperature control repeatability ≤0.1°C
Heating range: room temperature ~ 90°C
Integrated control
